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1

[IEEE 2011 22nd Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2011.05.16-2011.05.18)] 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Advanced overlay control in volume manufacturing

Wiltshire, Timothy, Ausschnitt, Christopher, Felix, Nelson, Hwang, Emily, Pike, Michael, Gabor, Allen, Preil, Moshe, Couraudon, Vincent, Schreiber, James, Fliervoet, Timon, Simons, Geert, Rottenkolber

Year:

2011

Language:

english

File:

PDF, 746 KB

english, 2011

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Influence of etch process on contact hole local critical dimension uniformity in extreme-ultraviolet lithography

Wallow, Thomas I., Hohle, Christoph K., Lorusso, Gian F., Mao, Ming, Reijnen, Liesbeth, Viatkina, Katja, Knops, Roel, Rispens, Gijsbert, Fliervoet, Timon

Year:

2015

Language:

english

File:

PDF, 577 KB

english, 2015

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Assist features: placement, impact, and relevance for EUV imaging

Panning, Eric M., Goldberg, Kenneth A., Mochi, Iacopo, Philipsen, Vicky, Gallagher, Emily, Hendrickx, Eric, Lyakhova, Kateryna, Wittebrood, Friso, Schiffelers, Guido, Fliervoet, Timon, Wang, Shibing,

Year:

2016

Language:

english

File:

PDF, 4.19 MB

english, 2016

4

SPIE Proceedings [SPIE 29th European Mask and Lithography Conference - Dresden, Germany (Tuesday 25 June 2013)] 29th European Mask and Lithography Conference - Actinic characterization and modeling of the EUV mask stack

Philipsen, Vicky, Hendrickx, Eric, Jonckheere, Rik, Davydova, Natalia, Fliervoet, Timon, Neumann, Jens Timo, Behringer, Uwe F. W., Maurer, Wilhelm

Year:

2013

Language:

english

File:

PDF, 1.91 MB

english, 2013

5

Analysis of nanoscale multilayers by EDXS and EELS in the STEM

Jürgen Thomas, Timon Fliervoet, Klaus Wetzig

Journal:

Applied Surface Science

Year:

2001

Language:

english

File:

PDF, 201 KB

english, 2001

6

Quartz deformation in a very fine grained quartzo-feldspathic mylonite: a lack of evidence for dominant grain boundary sliding deformation

Timon F. Fliervoet, Stanley H. White

Journal:

Journal of Structural Geology

Year:

1995

Language:

english

File:

PDF, 2.08 MB

english, 1995

7

Evidence for dominant grain-boundary sliding deformation in greenschist- and amphibolite-grade polymineralic ultramylonites from the Redbank Deformed Zone, Central Australia

Timon F. Fliervoet, Stanley H. White, Martyn R. Drury

Journal:

Journal of Structural Geology

Year:

1997

Language:

english

File:

PDF, 5.06 MB

english, 1997

8

Crystallographic preferred orientations and misorientations in some olivine rocks deformed by diffusion or dislocation creep

Timon F Fliervoet, Martyn R Drury, Prame N Chopra

Journal:

Year:

1999

Language:

english

File:

PDF, 3.52 MB

english, 1999

9

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - Experimental validation of novel EUV mask technology to reduce mask 3D effects

Behringer, Uwe F.W., Finders, Jo, Van Look, Lieve, Philipsen, Vicky, Hendrickx, Eric, Davydova, Natalia, Wittebrood, Friso, de Kruif, Robert, van Oosten, Anton, Miyazaki, Junji, Fliervoet, Timon, van

Year:

2015

Language:

english

File:

PDF, 1.22 MB

english, 2015

10

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Experimental validation of novel mask technology to reduce mask 3D effects

Hayashi, Naoya, Kasprowicz, Bryan S., Van Look, Lieve, Philipsen, Vicky, Hendrickx, Eric, Davydova, Natalia, Wittebrood, Friso, de Kruif, Robert, van Oosten, Anton, Miyazaki, Junji, Fliervoet, Timon,

Year:

2015

Language:

english

File:

PDF, 1.25 MB

english, 2015

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control

Finders, Jo, Levinson, Harry J., Dusa, Mircea V., Dusa, Mircea, Vleeming, Bert, Fliervoet, Timon, Hepp, Birgitt, Megens, Henry, Groenendijk, Remco, Quaedackers, John, Mos, Evert, Leewis, Christian, Bo

Year:

2009

Language:

english

File:

PDF, 1.58 MB

english, 2009

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Lithographic scanner stability improvements through advanced metrology and control

Vanoppen, Peter, Dusa, Mircea V., Conley, Will, Theeuwes, Thomas, Megens, Henry, Cramer, Hugo, Fliervoet, Timon, Ebert, Martin, Satriasaputra, Danu

Year:

2010

Language:

english

File:

PDF, 719 KB

english, 2010

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